You know more than I would, I'm only making loose inferences based on vague tidbits. I really only know the pop sci retelling of things in regards to the history of fusion projects, I just strongly suspect that by one means or another this tech or some other non-bomb-based nuclear pulse drive may be actively used, and the miniaturization of such tech would probably provide valuable data and resource to contribute to the energy-positive-fusion project.
Well, slight PL but I work somewhere in that field, so I get more into contact with the history and the technology. Miniaturisation isn't really a thing, the lasers have grown in size until NIF and even with all the advancements in technology (mainly pump diodes) they still need huge ass machinery. Lasers also suck in space, they will always produce massive amounts of waste heat, which is hard to remove in space.
But you know what you can actually miniaturise to some degree? Nuclear bombs. Has the added bonus that all the heat is outside the drive so little cooling is required compared to most other nuclear drives.
The dual use part of NIF and such is that nuclear weapons testing is restricted, and laser implosions give you decent approximations of fusion bomb conditions.
Although I also remember one of the old NIF founders and head honchos claiming at a recent conference that they totally achieved ignition even before NIF, but it was classified. The whole thing was a bit self-congratulatory and a masturbation show for the old guard of laser fusion tech, so take that how you want it.
Without going into too much detail, ASML’s giant EUV machines behave not too differently than the NIF (perfectly timed precision drops of fluid targeted with ultra-fast/delicate lasers in a damn-near perfectly controlled environment).
It's quite different, though. NIF has hundreds of beamlines targeting a single, static target, the ASML machine has a single laser hitting a moving target. Although a commercial fusion reactor would also involve a similar injection system for targets since they have to run at around 10 Hz to be viable. It's gonna be fun, hitting a sub mm sized moving target with hundreds of individual laser pulses in a very precisely timed manner. The fundamental laser designs are also vastly different (flashlamp pumped Nd:Glass amplifiers frequency tripled into UV vs CO2-laser-pulse induced tin plasma). Actually, the EUV light in the lithography machine isn't even coherent anymore.
Btw, neither ASML/Trumpf nor NIF use ultrafast lasers at the moment, they both use nanosecond pulses. The timing is gonna be really fun once people start to use femtosecond pulses.
Another side note, I once attended a seminar where there were two guys from Trumpf and ASML talking about their EUV machine and how they improved the efficiency (which is still pretty horrible to this day). The Trumpf EUV laser is a fun one, it uses a pulsed CO2 laser at 10.6µm wavelength to turn a tin drop into a plasma. After the talk I asked the guy, "Why CO2? They're hilariously inefficient, and you guys build much more compact disk lasers at near infrared wavelengths that are probably much easier to handle, and I don't see an advantage of far infrared over near infrared for the driver here". The answer? "Well, when we started the development of this there were no disk lasers powerful enough so we used CO2, and now we continue to use those because backwards compatibility with existing systems". Much of the size of the initial laser driver is just legacy tech, which I find hilarious. The lasers at NIF are also very obsolete by today's standards, although it's more understandable because pump diodes at this scale only very recently started to be even feasible. We still haven't seen a petawatt-class laser that is all diode pumped, they're all under construction/in development still. Pump intensity is still a problem.
ASML and Trumpf are very protective of this system because they basically have the market monopoly on EUV lithography. Nobody but Trumpf has a commercial EUV light source, nobody but Zeiss has commercial optics suitable, and nobody but ASML has the handling tech for this level of accuracy. China and Russia are dabbling in developing their own systems these days, and there isn't really any magic in any of the component. Generating EUV light can be done in various ways, I had a lab course in uni fiddling around with a plasma source from the early development days of EUV sources, back before Trumpf got their source commercialised and the world decided that laser-tin-plasma is the way to go. Russia is developing a new one, and it scares Trumpf. Even though they still need the optics (and meter-sized optics with that kind of surface accuracy are really hard) and handling machines. China is getting better and better at ultra high quality optics, so I don't doubt they'll figure out their own EUV lithography machine very soon. Again, there isn't any real magic in it, ASML/Trumpf/Zeiss were just the first ones to put it all together and have the industrial capacity to build them in series. But China will follow soon.
Then it's up to what is going to be the next step in electronics. If it even is going to be electronics per se. With 13.6 nm wavelength you can make very fine structures. Finer than what silicone electronics can even use, so the old Tick Tock development plan for computer chips is running into problems. Next step is either different materials or a radically different approach like spintronics. Which is still far from actually being ready.
Really, people just need to get back to programming efficiently.